Photoresist & Photoresist Ancillaries Market Predictions 2022- Top Competitors| Tokyo Ohka Kogyo Co., Ltd, JSR Corporation, DuPont, Shin-Etsu Chemical Co., Ltd and others
Verfasser: ashwani_kailiya on Wednesday, 6 July 2022The global photoresist and photoresist ancillaries market size is estimated to be USD 3.3 billion in 2020 and projected to reach USD 4.2 billion by 2025, at a CAGR of 4.8%. A photoresist is a light-sensitive material applied to a substrate during photolithography or photoengraving to enable the desired pattern to be imaged, i.e., a properly exposed and developed photoresist masks portions of the substrate with extremely high precision. The growing semiconductor demand and upcoming nanoelectromechanical systems (NEMS) are expected to drive the photoresist and photoresist ancillaries market.
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Photoresists are classified broadly based on their response to a specific wavelength of light. These materials are sensitive to wavelengths 193 nm (ArF), 248 nm (KrF), 365 nm (I-line), and 436 nm (G-line). Among the mentioned photoresists, ArF is the most widely used as it provides superior resolution with low defect levels, owing to its narrow wavelength and ability to break through a 10 nm level. Antireflective coating, developer, and remover are some of the types of photoresist ancillaries that are majorly used during photolithography.